Wen-Zhi Zhang, Xiao-Ying Zhang*, Zhi-Xuan Zhang, Yun-Shao Cho, Chien-Jung Huang, Gao Peng, Lin-Qin Jiang, Yu Qiu, Shui-Yang Lien*. Evaluation of performance and reliability of TFT devices with ultra-thin HfTiO dielectric layer deposited by plasma enhanced atomic layer deposition. Surface & Coating Technology, 2025; 497:131782.
Fang-Bin Ren, Zhan-Bo Su, Xiao-Ying Zhang*, and Shui-Yang Lien*. MgGaO solar-blind photodetectors with ultralow dark-current prepared by adjusting MgO cycle ratio. IEEE SENSORS JOURNAL, 2025; 25(11) :18812.
Zhan-Bo Su, Xiao-Ying Zhang*, Xiao Lin, Cheng-Xiang Quan, Chia-Hsun Hsu, Peng Gao, Wan-Yu Wu, Dong-Sing Wuu, Feng-Min Lai, Shui-Yang Lien*. Effect of substrate temperature on growth mechanism and properties of PEALD-MgO dielectric films for amorphous-IGZO TFTs. Surface & Coating Technology, 2024; 483:130819.
Xiao-Ying Zhang, Duan-Chen Peng, Jia-Hao Yan, Zhi-Xuan Zhang, Yu-Jiao Ruan,Juan Zuo, An Xie, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, Feng-Min Lai, Shui-Yang Lien, Wen-Zhang Zhu. Plasma power effect on crystallinity and density of AlN films deposited by plasma enhanced atomic layer deposition. Journal of Materials Research and Technology, 2023, 27: 4213-4223.
Xiao-Ying Zhang, Jing Han, Yao-Tian Wang, Yu-Jiao Ruan, Wan-Yu Wu, Dong-Sing Wuu, Juan Zuo, Feng-Min Lai, Shui-Yang Lien, Wen-Zhang Zhu. Effect on passivation mechanism and properties of HfO2 crystalline-Si interface under different annealing atmosphere. Solar Energy Materials and Solar Cells, 2023; 257: 112384.
Xiao-Ying Zhang, Duan-Chen Peng, Jing Han, Fang-Bin Ren, Shi-Cong Jiang, Ming-Chun Tseng, Yu-Jiao Ruan, Juan Zuo, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, Shui-Yang Lien and Wen-Zhang Zhu. Effect of substrate temperature on properties of AlN buffer layer grown by remote plasma ALD. Surfaces and Interfaces, 2023; 36: 102589.
Xiao-Ying Zhang, Chao Chen, Jin-Fa Zhang, Yu-Jiao Ruan, An Xie, Wan-Yu Wu, Dong-Sing Wuu, Shui-Yang Lien and Wen-Zhang Zhu. Modulation of the conductive behavior of NiO thin film deposited by HiPIMS through varying the O2 flow ratio. Ceramics International, 2022; 48: 34668-34677.
Xiao-Ying Zhang, Jing Han, Duan-Chen Peng, Yu-Jiao Ruan, Wan-Yu Wu, Dong-Sing Wuu, Shui-Yang Lien and Wen-Zhang Zhu. Crystallinity effect on electrical properties of PEALD-HfO2 thin films prepared by different substrate temperatures. Nanomaterials, 2022; 12: 3890.
Xiao-Ying Zhang, Yue Yang, Wei-Hang Fan, Chen Wang, Wan-Yu Wu, Ming-Chun Tseng, Dong-Sing Wuu, Peng Gao, Hao-Chung Kuo, Shui-Yang Lien and Wen-Zhang Zhu. Growth and characterization of Si-doped Ga2O3 thin films by remote plasma atomic layer deposition: Toward UVC-LED application. Surface & Coating Technology, 2022; 435:128252.
Xiao-Ying Zhang, Yue Yang, Zhi-Xuan Zhang, Xin-Peng Geng, Chia-Hsun Hsu, Wan-Yu Wu, Shui-Yang Lien and Wen-Zhang Zhu. Deposition and characterization of RP-ALD SiO2 thin films with different oxygen plasma powers. Nanomaterials, 2021; 11:1173.